Products >> Inorganic >> Sputtering Targets
SiO2 Sputtering Targets
- Product No.:14808-60-7
- Molecular Formula:SiO2
- Usage:optical coating, vacuum coating, sputtering target material, magnetic film, electronic material, alloy material,
For optical coating, vacuum coating, sputtering target material, magnetic film, electronic material, alloy material, etc.
|
Name |
Silicon Dioxide Target |
|
Purity |
99.99% |
|
Size |
Φ255.6×12.7mm or customized |
|
Density |
2.4g/cm3 |
|
Melting point |
1670℃ |
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