Products >> Inorganic >> Sputtering Targets

ITO Sputtering Targets

Product No.：50926-11-9
Molecular Formula：In2O3.x(SnO2)
Usage：For optical coating, vacuum coating, sputtering target material, magnetic film, electronic material, alloy material, etc.
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Item	Standard
Components	In2O3:SnO2=90:10(wt%), or to customer requirements
Purity	4N
Relative density	≥99.3% (theoretical:7.15g/cm3)
Resistivity	≤1.8Ω·mm2/m
Oxygen bleeding rate	≤0.5%
Appearance	Flakes or other shapes color is uniform; smooth surface, without cracks, edges and corners, and without any foreign inclusions and pollutants
Internal	no crack or foreign matter inside